JPH0341461Y2 - - Google Patents

Info

Publication number
JPH0341461Y2
JPH0341461Y2 JP16276486U JP16276486U JPH0341461Y2 JP H0341461 Y2 JPH0341461 Y2 JP H0341461Y2 JP 16276486 U JP16276486 U JP 16276486U JP 16276486 U JP16276486 U JP 16276486U JP H0341461 Y2 JPH0341461 Y2 JP H0341461Y2
Authority
JP
Japan
Prior art keywords
semiconductor wafer
heating
fluid
heated
inert gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP16276486U
Other languages
English (en)
Japanese (ja)
Other versions
JPS6367239U (en]
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP16276486U priority Critical patent/JPH0341461Y2/ja
Publication of JPS6367239U publication Critical patent/JPS6367239U/ja
Application granted granted Critical
Publication of JPH0341461Y2 publication Critical patent/JPH0341461Y2/ja
Expired legal-status Critical Current

Links

JP16276486U 1986-10-22 1986-10-22 Expired JPH0341461Y2 (en])

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16276486U JPH0341461Y2 (en]) 1986-10-22 1986-10-22

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16276486U JPH0341461Y2 (en]) 1986-10-22 1986-10-22

Publications (2)

Publication Number Publication Date
JPS6367239U JPS6367239U (en]) 1988-05-06
JPH0341461Y2 true JPH0341461Y2 (en]) 1991-08-30

Family

ID=31090339

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16276486U Expired JPH0341461Y2 (en]) 1986-10-22 1986-10-22

Country Status (1)

Country Link
JP (1) JPH0341461Y2 (en])

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2728766B2 (ja) * 1990-07-18 1998-03-18 株式会社東芝 半導体の処理方法およびその装置
NL1011487C2 (nl) * 1999-03-08 2000-09-18 Koninkl Philips Electronics Nv Werkwijze en inrichting voor het roteren van een wafer.
JP4616873B2 (ja) * 2007-09-28 2011-01-19 東京エレクトロン株式会社 半導体製造装置、基板保持方法及びプログラム
JP6697089B2 (ja) * 2016-03-18 2020-05-20 エーシーエム リサーチ （シャンハイ） インコーポレーテッド 基板熱処理装置

Also Published As

Publication number Publication date
JPS6367239U (en]) 1988-05-06

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